首页> 外国专利> Semiconductor component for use in integrated circuit application, has electrically conductive stubbles with form like via fillings, provided on conductor surface of lower metal insulated metal capacitor electrode

Semiconductor component for use in integrated circuit application, has electrically conductive stubbles with form like via fillings, provided on conductor surface of lower metal insulated metal capacitor electrode

机译:在集成电路应用中使用的半导体组件,在下部金属绝缘金属电容器电极的导体表面上提供具有类似通孔填充形式的导电小茬

摘要

The component has a lower metal insulated metal capacitor electrode arranged on a substrate, where a conductor surface (13) of the electrode has electrically conductive stubbles (4) having form like via fillings (12). A capacitor dielectric (5) overlaps the electrode. An electrically conductive layer (6) arranged as an upper capacitor electrode on the dielectric refills the spaces between the stubbles. An independent claim is also included for a method for manufacturing a semiconductor unit.
机译:该部件具有布置在基板上的下部金属绝缘的金属电容器电极,其中电极的导体表面(13)具有形状像通孔填充物(12)的导电小茬(4)。电容器电介质(5)与电极重叠。布置为电介质上的上部电容器电极的导电层(6)填充了残茬之间的空间。还包括用于制造半导体单元的方法的独立权利要求。

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