Laser light homogenization arrangement for use in mask inspection system in semiconductor manufacture, has diffraction grating arranged before first lens array for producing continuous spectrum of laser light

摘要

The arrangement includes two parallel lens arrays (2,3). A diffraction grating (7) is arranged before the first lens array (2) for bending the wavelength coverage of a laser source in the focusing direction of the first lens array to produce an expanded continuous spectrum of laser light. Another diffraction grating (8) is arranged before the other diffraction grating (7) for expanding the laser light in a dispersion direction perpendicular to the diffraction grating (7).