首页> 外国专利> Scatter parameter measurement method for measuring the scatter parameters of a multiple gate, in which a correction calculation is carried out to compensate for the use of reflecting gate connections

Scatter parameter measurement method for measuring the scatter parameters of a multiple gate, in which a correction calculation is carried out to compensate for the use of reflecting gate connections

机译:用于测量多栅极的散射参数的散射参数测量方法,其中进行校正计算以补偿反射门连接的使用

摘要

Measurement method for measuring the scatter parameters of a multiple gate (32) that has multiple gates (33 1-33 n) using a calibrated 2-gate network analyzer. According to the method, external reflecting connections (35 1-35 n) to the gate are used that are not matched to the gate impedances (33 1-33 n). The influence of the reflection from the reflecting connections is eliminated using a correction calculation and the error-corrected scatter parameters of the multiple gate are determined. An independent claim is made for a device for measuring the scatter parameters of a multiple gate.
机译:一种使用校准的2门网络分析仪测量具有多个门(33 1-33 n)的多门(32)的散射参数的测量方法。根据该方法,使用到栅极的外部反射连接(35 1-35 n),其与栅极阻抗(33 1-33 n)不匹配。使用校正计算消除了来自反射连接的反射的影响,并确定了多栅极的经过误差校正的散射参数。对用于测量多栅极的散射参数的装置提出了独立的权利要求。

著录项

  • 公开/公告号DE102005013583A1

    专利类型

  • 公开/公告日2006-03-16

    原文格式PDF

  • 申请/专利权人 ROHDE & SCHWARZ GMBH & CO. KG;

    申请/专利号DE20051013583

  • 发明设计人 SCHIEK BURKHARD;ROLFES ILONA;

    申请日2005-03-23

  • 分类号G01R27/28;G01R35/00;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:19

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