首页> 外国专利> Plant for synthesis and crystal growth of semiconductor using vertical gradient freeze crystal-growing ovens, comprises inside reaction chamber that has sublimation chamber and synthesis chamber connected over a mixing chamber and a valve

Plant for synthesis and crystal growth of semiconductor using vertical gradient freeze crystal-growing ovens, comprises inside reaction chamber that has sublimation chamber and synthesis chamber connected over a mixing chamber and a valve

机译:使用垂直梯度冷冻晶体生长炉用于半导体合成和晶体生长的设备,包括内部反应室,该反应室具有升华室和连接在混合室和阀上方的合成室

摘要

Synthesis chamber (2) contains a crucible (3) for admission of element (5) and another element (10) is connected directly or indirectly into the sublimation chamber. The crucible exhibits a channel at the base for the admission of a single crystal germ. The valve is connected at one or several places of the sublimation, synthesis and mixing chamber (7). An independent claim is included for procedure of synthesis and crystal growth of semiconductor.
机译:合成室(2)包含一个坩埚(3),用于放入元素(5),另一个元素(10)直接或间接连接到升华室中。坩埚的底部有一个通道,可以容纳单晶种。该阀连接在升华,合成和混合室(7)的一个或几个位置。对于半导体的合成和晶体生长的过程包括独立的权利要求。

著录项

  • 公开/公告号DE102005015472A1

    专利类型

  • 公开/公告日2006-10-05

    原文格式PDF

  • 申请/专利权人 PHOSTEC S.R.O.;

    申请/专利号DE20051015472

  • 发明设计人 MATUSKA JOZEF;

    申请日2005-04-04

  • 分类号C30B11;C30B29/40;C30B11/04;

  • 国家 DE

  • 入库时间 2022-08-21 21:20:20

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