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Plasma/radical stream generation device for cleaning workpiece, has pipe centered into rear extension of tubular side piece of inner conducting system so that gas is supplied to open end of coaxial conducting system for production of stream
Plasma/radical stream generation device for cleaning workpiece, has pipe centered into rear extension of tubular side piece of inner conducting system so that gas is supplied to open end of coaxial conducting system for production of stream
The device has an angular conducting system whose side piece is connected with a coaxial cable for supplying high frequency energy. An inner pipe (10) is centered into rear extension of a tubular side piece of an inner conducting system via a related hole in a wall of a central base body and is led outward, such the gas/gas mixture is supplied to an open end of a coaxial conducting system, for the production of plasma/radical stream.
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