method for stopping of ions and impurities in plasma strahlungquellen in extreme - ultaviolett or soft x-ray bands by using krypton

摘要

A method and device for filtering ions and small debris by using krypton or its mixtures to fill the chamber of the EUV-radiation source. The method can be combined with mechanical methods of filtering debris particles with large size (greater than one micron) and allows to obtain plasma EUV-radiation without polluting debris and to extend the useful life of the mirrors of a microlithography apparatus. IMAGE