Precursors for chemical vapour deposition comprising metal amp; ligand with co-ordinating N amp; O, separated by 2 or 3 carbons, amp; sterically hindering substituent

摘要

Group 3B, 4B and rare earth metal precursors for chemical vapour deposition comprise the metal and at least one ligand having oxygen and nitrogen available for co-ordination with the metal, the oxygen and nitrogen being separated by 2 or 3 carbon atoms in the ligand and having sterically hindering groups on the nitrogen and/or the oxygen and/or a carbon adjacent to nitrogen and/or oxygen. A preferred ligand is the donor functionalised alkoxy ligand 2-(4,4-dimethyloxazolinyl)- propan-2-olate, [NC(CH3)2CH2OCC(CH3)2O] (abbrev.''dmop'').