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PROCESS AND DEVICE WHICH PREVENT CARBON MONOXIDE POISONING IN PERIPHERAL EDGE OF SUBSTRATE IN THIN-FILM DEPOSITION SYSTEM

机译:薄膜沉积系统中防止基质周边发生一氧化碳中毒的过程和装置

摘要

PROBLEM TO BE SOLVED: To provide a method and device which prevent carbon monoxide poisoning of a thin metal film formed on a substrate by use of a metal carbonyl precursor.;SOLUTION: The thin metal films 840 and 860 are formed on substrates 25 and 125 mounted on the thin-film deposition systems 1,100 and the substrate holders 20 and 120. The substrate holders 20 and 120 have protective rings 21 and 124 which are mounted in the peripheral edges of the substrate holders 20 and 120 and surrounds the peripheral edges of substrates 25 and 125. The protective rings 21 and 124 prevent formation of CO by-product in the peripheral edges of substrates 25 and 125.;COPYRIGHT: (C)2008,JPO&INPIT
机译:解决的问题:提供一种防止通过使用羰基金属前体而在基板上形成的金属薄膜的一氧化碳中毒的方法和装置。解决方案:在基板25和125上形成金属薄膜840和860。安装在薄膜沉积系统1100和基板支架20和120上。基板支架20和120具有保护环21和124,它们安装在基板支架20和120的外围边缘中并围绕基板的外围边缘参见图25和125。保护环21和124防止在衬底25和125的外围边缘中形成CO副产物。;版权所有:(C)2008,JPO&INPIT

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