ECCENTRICITY MEASURING METHOD OF REFLECTIVE ASPHERICAL SURFACE OPTICAL ELEMENT, MANUFACTURING METHOD OF OPTICAL SYSTEM, REFLECTIVE ASPHERICAL SURFACE OPTICAL ELEMENT AND OPTICAL SYSTEM

摘要

PPROBLEM TO BE SOLVED: To accurately measure the eccentricity of reflective aspherical surface optical element. PSOLUTION: The measurement contains a procedure to arrange a reflective aspherical optical element (11) having a first reference plane (14a) and a null optical element (13) having a second reference plane (15a) in a measuring light flux of an interferometer, a procedure to detect each of a reflective aspherical surface (11a) of the reflective aspherical optical element (11), the first reference plane (14a) and the second reference plane (15a) on a common reference plane (24a) of the interferometer, keeping the arrangement relation between the reflective aspherical optical element (11) and the null optical element (13), and a procedure to obtain the eccentricity of the reflective aspherical optical element (11) for the reference of the second reference plane (14a) from the results of each detection. As a common reference plane (24a) is referred, a posture error of the reference plane (24a) does not affect. Also, as information on posture of the null optical element (13) is obtained, the posture error of the null optical element (13) can be avoided from the measurement results. PCOPYRIGHT: (C)2007,JPO&INPIT