MASK FOR X-RAY LITHOGRAPHY, MANUFACTURING METHOD THEREOF, MANUFACTURING METHOD OF LIGHT REFLECTION PREVENTION STRUCTURE USING THE SAME, FORMING BODY USING LIGHT REFLECTION PREVENTION STRUCTURE, AND MANUFACTURING METHOD OF GLASS OBJECT TO BE FORMED OR RESIN OBJECT TO BE FORMED

摘要

PROBLEM TO BE SOLVED: To provide a mask for X-ray lithography that can be manufactured inexpensively and easily.;SOLUTION: The mask 1 for X-ray lithography is used to manufacture the light reflection prevention structure 22 having a light reflection irregular structure 23 by X-ray lithography. The mask 1 for X-ray lithography has a first substrate 10 for transmitting X rays, and an X-ray shielding film 11 formed on the first substrate 10. The X-ray shielding film 11 includes an X-ray shielding material, and contains a plurality of X-ray transmission sections 11a. The plurality of X-ray transmission sections 11a are arranged along the direction of a film surface at a pitch that is not larger than the wavelength of light where reflection is suppressed by the light reflection prevention irregular structure 23.;COPYRIGHT: (C)2007,JPO&INPIT