The composition and photoresist polymers having prepared by living free radical process, the polymer resin of methacrylic acid-based or methacrylic acid

摘要

The present invention is directed to the preparation of photoresist polymer according to the techniques of living free radical polymerization. In one aspect, the present invention is used as a polymerization component, a large ester monomer sterically. By using the chain transfer agent is included in the polymerization process conditions. Cleaving the end groups of the polymer containing a hetero atom is described. In one aspect, the polymer of the present invention is a random copolymer, in a batch process can be prepared by the polymerization reaction conditions, or semi-continuous.