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Distribution facilities it does the earthed electrode on one side of the substrate for thin film formation

机译:分布设施可在基板的一侧进行接地电极以形成薄膜

摘要

PROBLEM TO BE SOLVED: To provide a highly productive thin film deposition system by plasma discharge provided with a durable shower electrode to make the continuous film depositing time as long as possible and a deposition preventive sheet and a method of manufacturing the shower electrode for the system.;SOLUTION: A grounded electrode is provided on one side of a substrate for thin film deposition in a film deposition chamber, and a high-frequency electrode provided with an electrode main body, a gas inlet and a shower electrode having a gas circulating hole is furnished on the other side to constitute a thin film deposition system for depositing a thin film on the principal plane of the substrate. In this case, a second small rugged face is allowed to overlap a first large rugged face to let the surface of the shower electrode 5 have two large and small average surface roughnesses.;COPYRIGHT: (C)2001,JPO
机译:要解决的问题:通过等离子放电提供具有高生产率的薄膜沉积系统,该系统具有耐用的淋浴电极,以使连续的膜沉积时间尽可能长,并且还提供了一种防沉积片以及用于该系统的淋浴电极的制造方法解决方案:接地电极设置在基板的一侧,用于在薄膜沉积室中沉积薄膜;高频电极设有电极主体,气体入口和带有气体流通孔的喷淋电极在另一侧上设置有用于在基板的主平面上沉积薄膜的薄膜沉积系统。在这种情况下,允许第二小凹凸面与第一大凹凸面重叠,以使淋浴电极5的表面具有两个大的和小的平均表面粗糙度。;版权:(C)2001,JPO

著录项

  • 公开/公告号JP3975387B2

    专利类型

  • 公开/公告日2007-09-12

    原文格式PDF

  • 申请/专利号JP20000035572

  • 发明设计人 藤掛 伸二;

    申请日2000-02-14

  • 分类号C23C16/54;C23C16/505;H01L21/205;H01L31/04;

  • 国家 JP

  • 入库时间 2022-08-21 21:12:11

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