BASIC COMPOUND, RADIATION-SENSITIVE ACID DIFFUSION CONTROLLING AGENT, AND POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a basic compound suitable as an acid diffusion controller in a positive-type radiation-sensitive resin composition useful for fine processing in which every kind of radiation, such as far ultraviolet rays, an electron beam, and X rays, is used.;SOLUTION: This basic compound comprises an onium salt expressed by general formula (1) (at least one of Z¹ and Z² is F or a 1-10C straight-chain or branched-chain perfluoroalkyl; R¹s may be identical to or different from each other and are each an alkyl or a cycloalkyl, or two of R¹s and N bonded thereto together form a ring; A is a bivalent organic group or a single bond; and M⁺ is a sulfonium cation, an iodonium cation or the like).;COPYRIGHT: (C)2007,JPO&INPIT