At drawing condition and the process condition for being equal to the aforementioned actual pattern which inspection conditional amendment

摘要

PROBLEM TO BE SOLVED: To provide an inspection conditional correction method of a pattern inspection system, which further improves the inspection accuracy. ;SOLUTION: A scanning is performed on a monitor pattern for measuring the correction values of an optical system, a stage system, and a design data as formed on a photomask to determine the correction value of the optical system from a sensor image data obtained from the scanning. The sensor image data, obtained by the scanning, are compared with a pattern data (design data) for determining the correction value of the stage system. The sensor image data, obtained by the scanning, are compared with the pattern data to determine the correction value of the pattern data. Then, inspection conditions are corrected based on the correction values of the optical system, and the stage system and the pattern data thus obtained.;COPYRIGHT: (C)2001,JPO