首页> 外国专利> SILICA-BASED COATING FILM, COMPOSITION FOR FORMING SILICA-BASED COATING FILM, METHOD FOR FORMING SILICA-BASED COATING FILM, AND LAMINATED BODY

SILICA-BASED COATING FILM, COMPOSITION FOR FORMING SILICA-BASED COATING FILM, METHOD FOR FORMING SILICA-BASED COATING FILM, AND LAMINATED BODY

机译:二氧化硅基涂层膜,用于形成二氧化硅基涂层膜的组合物,用于形成二氧化硅基涂层膜的方法以及层压体

摘要

PROBLEM TO BE SOLVED: To provide a silica-based coating film capable of sufficiently preventing reflection when it is provided on the surface of a transparent substrate.;SOLUTION: The silica-based coating film is the one to be formed on a transparent substrate and has a refractive index of ≤1.41. A method for forming the silica-based coating film includes: a process for forming a coated film by applying a composition for forming the silica-based coating film on the surface of the transparent substrate; a process for obtaining a dried coated film by removing a solvent contained in the coated film; and a process for firing the dried coated film. Concretely, the composition for forming the silica-based coating film is applied on a silicon wafer by spin coating, and then the solvent contained in the composition is removed, and the coating film is formed on the silicon wafer by curing the resulting composition under a nitrogen atmosphere.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种基于二氧化硅的涂膜,当其被提供在透明基板的表面上时能够充分防止反射。;解决方案:该基于二氧化硅的涂膜是在透明基板上形成的一种,并且折射率为≤ 1.41。形成二氧化硅基涂膜的方法包括:通过在透明基板的表面上涂布用于形成二氧化硅基涂膜的组合物来形成涂膜的工艺;通过除去涂膜中包含的溶剂来获得干燥的涂膜的方法;以及干燥后的涂膜的烧成方法。具体地,将用于形成二氧化硅基涂膜的组合物通过旋涂施涂在硅晶片上,然后除去该组合物中包含的溶剂,并通过在20℃下固化所得的组合物在硅晶片上形成涂膜。氮气氛;版权所有:(C)2007,日本特许厅

著录项

  • 公开/公告号JP2006342048A

    专利类型

  • 公开/公告日2006-12-21

    原文格式PDF

  • 申请/专利权人 HITACHI CHEM CO LTD;

    申请/专利号JP20060130675

  • 发明设计人 ABE KOICHI;OKANIWA KO;SAKURAI HARUAKI;

    申请日2006-05-09

  • 分类号C01B33/12;

  • 国家 JP

  • 入库时间 2022-08-21 21:10:51

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