首页> 外国专利> PATTERNED LIGHT IRRADIATION APPARATUS, THREE-DIMENSIONAL SHAPE MEASURING APPARATUS, AND PATTERNED LIGHT IRRADIATION METHOD

PATTERNED LIGHT IRRADIATION APPARATUS, THREE-DIMENSIONAL SHAPE MEASURING APPARATUS, AND PATTERNED LIGHT IRRADIATION METHOD

机译:图案化光照射装置,三维形状测量装置以及图案化光照射方法

摘要

PROBLEM TO BE SOLVED: To provide a patterned light irradiation apparatus which can irradiate sinusoidal patterned light suitable for image processing at low cost.;SOLUTION: A pattern projection unit 1 for irradiating an object under measurement 200 with patterned light, comprises a projection pattern 12 in which a plurality of opening parts having a predetermined opening width are provided at predetermined intervals, a light source 10 and a collecting lens 11 for irradiating the projection pattern 12 with light, and a projection lens 13 for integrally collecting light passed through the projection pattern 12 and irradiating the object under measurement 200 with the collected light. The projection lens 13 is placed out of focus so that an image of the projection pattern 12 is not formed on the object under measurement 200. The image of the projection pattern 12 is thereby projected onto the object under measurement 200 as a sinusoidal pattern.;COPYRIGHT: (C)2007,JPO&INPIT
机译:解决的问题:提供一种图案化的光照射设备,其能够以低成本照射适合于图像处理的正弦图案化的光。解决方案:用于以图案化的光照射被测物200的图案投影单元1,包括投影图案12。其中,以预定间隔设置有具有预定开口宽度的多个开口部的光源10和用于对光照射投射图案12的聚光透镜11,以及用于整体地收集通过投射图案的光的投射透镜13。参照图12,用收集的光照射被测物200。投影透镜13未对准焦点,从而在被测物200上不形成投影图案12的图像。由此,将投影图案12的图像作为正弦图案投影到被测物200上。版权:(C)2007,日本特许厅&INPIT

著录项

  • 公开/公告号JP2007085862A

    专利类型

  • 公开/公告日2007-04-05

    原文格式PDF

  • 申请/专利权人 OMRON CORP;

    申请/专利号JP20050274404

  • 申请日2005-09-21

  • 分类号G01B11/25;

  • 国家 JP

  • 入库时间 2022-08-21 21:10:41

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