The electron gun which generates the device null electron beam which suppresses the aberration which originates in the space charge in

摘要

PROBLEM TO BE SOLVED: To provide an electronic beam lithographic apparatus, capable of controlling or suppressing aberrations due to spatial charges.;SOLUTION: An electronic beam lithographic apparatus comprises an electron gun for feeding a beam of accelerated electrons, a mask stage for holding a mask on a path of the accelerated electron beam, and a work stage for holding a work on a path of electrons which have passed through the mask. The electron gun comprises a cathode with an electron emitting surface, an anode connected to an accelerating voltage power source for generating an electric field for accelerating electrons, emitted from the cathode and a current density section control grating disposed between the anode and the cathode. The current density section control grating is so constituted, as to generate an electron beam having nonuniform current density section from the electron gun.;COPYRIGHT: (C)2002,JPO