MASK CLEANING APPARATUS, MASK CLEANING METHOD, METHOD OF FORMING VAPOR-DEPOSITED FILM, DEVICE FOR MANUFACTURING EL DISPLAY DEVICE, AND METHOD OF MANUFACTURING EL DISPLAY DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method and cleaning apparatus which allows reduction of damage to a mask surface.;SOLUTION: The cleaning apparatus for cleaning a mask for use in vapor-deposition includes a vacuum chamber which has the mask disposed therein, a support means for supporting the mask so that a top face and a bottom face of the mask are exposed, a plasma source which is arranged in an area other than the disposition area of the mask and generates etching gas for cleaning the mask, and a guide means for guiding the etching gas generated by the plasma source to the exposed top face and bottom face of the mask.;COPYRIGHT: (C)2007,JPO&INPIT