The production mannered null following expression of the titanium content thin film which uses the solution raw materials and the said raw materials which for organicity metal chemical vapor deposition method

摘要

PROBLEM TO BE SOLVED: To provide a raw material solution for organometallic chemical vapor deposition with which uniform, stable vaporization can be performed, and a titanium-containing thin film of high purity can be obtained at a high film deposition rate, and to provide the titanium-containing thin film of high purity which has excellent adhesion as a base of a copper thin film.;SOLUTION: The raw material solution for the organometallic chemical vapor deposition is obtained by dissolving a titanium complex shown by following formula (1) into an amine solvent, concretely of one or more kinds of compounds selected from the group consisting of n-methyl-2-pyrrolidone, dimethylaniline, di-t-butylaniline, di-n-butylaniline, diisopropylaniline, tri-t- butylaniline and triisopropylaniline; in formula (1), R is a 1 to 4 straight-chain or branched alkyl group.;COPYRIGHT: (C)2003,JPO