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Low the crystal Characteristic silica and the production mannered null thickness
Low the crystal Characteristic silica and the production mannered null thickness
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机译:晶体特性低的二氧化硅和生产合理的零厚度
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摘要
PROBLEM TO BE SOLVED: To obtain a scaly low crystalline silica harmless to a human body, excellent in reactivity on the surface useful as a filler for cosmetic, antiperspirant, pack agent, coating material or resin and for various carriers and to provide a method for producing the silica. ;SOLUTION: This scaly low crystalline silica has 0.001-1 μm thickness, 10 ratio (aspect ratio) of the longest length of the scaly plate to the thickness, ≥3 ratio of the shortest length of the scaly plate to the thickness, 10% measured value of crystal type free silicic acid by X-ray diffraction a nalysis and silanol group absorptions at 3,600-3,700 and 3,400-3,500 cm-1 of IR spectrum. This method for producing the silica comprises dealkalizing an aqueous solution of a silicic acid to give a silica sol and subjecting the sol to hydrothermal treatment.;COPYRIGHT: (C)1999,JPO
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机译:解决的问题:获得对人体无害的鳞状低结晶二氧化硅,在表面上具有优异的反应性,可用作化妆品,止汗剂,包装剂,涂料或树脂以及各种载体的填充剂,并提供用于生产二氧化硅。 ;解决方案:这种鳞片状低结晶二氧化硅的厚度为0.001-1μm,鳞片状板的最长长度与厚度之比为10(纵横比),鳞片状板的最短长度与厚度之比为&ge; 3。 ,通过X射线衍射,分析和在3,600-3,700 cm和3,400-3,500 cm -1 Sup>的硅烷醇基团的吸收和硅醇基吸收率,<10%晶体型游离硅酸的测量值。该生产二氧化硅的方法包括将硅酸的水溶液脱碱以得到二氧化硅溶胶,并对该溶胶进行水热处理。;版权所有:(C)1999,JPO
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