Being manner in order to create the proofreading target of the single material which possesses the manner in order to creating the proofreading

摘要

PROBLEM TO BE SOLVED: To provide a calibration target for topographic inspection instrument having a reference mark on the order of 10Å at a height in the longitudinal direction at a distance of atomic scale and operable at a resolution level lower than μm. ;SOLUTION: A typical thermal oxide is deposited thick on the surface of a silicon wafer 20 for forming a reference mark. The reference mark is patterned at a level of bare silicon on the surface of silicon and then etched. The etched region is replaced by a thin oxide and the silicon level is lowered slightly thereat. Subsequently, the oxide is removed entirely and the silicon of slightly low level provides a reference mark having topographic dimensions of atomic scale in the longitudinal direction. Several millions of such reference marks are formed simultaneously on the wafer and simulate the effect of haze or micro irregularities on a polished wafer.;COPYRIGHT: (C)1997,JPO