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The laser device null YLF laser illuminant for exposure which uses

机译:激光设备用于曝光的零YLF激光光源

摘要

PROBLEM TO BE SOLVED: To provide a light exposure laser device which is capable of making a gas laser source which emits light of wavelength 190 nm or below emit laser rays which are easily stabilized in wavelength and lessened in band width. SOLUTION: A coherent light source 1 is composed of a laser ray source which oscillates laser pulses whose oscillation frequencies are narrow in band width, a nonlinear optical crystal for obtaining the higher harmonics or light of sum frequency of the output light of the laser source, and a wavelength conversion means which uses an induction Raman effect, light emitted from the coherent light source 1 is stabilized in wavelength by a wavelength stabilizing means 3, and a seed light nearly equal in wavelength to laser rays emitted from the gas laser source 2 is emitted from the wavelength stabilizing means 3. The seed light is synchronously injected into the gas laser source 2 composed of a F2 laser or the like, and the gas laser source 2 emits light pulses which are 190 nm or below in wavelength. The rise timing of light pulses emitted from the coherent light source 1 and the rise timing of oscillation pulses of the gas laser source 2 are controlled by a timing control means 4.
机译:解决的问题:提供一种曝光激光装置,其能够使发射波长为190nm或更低的光的气体激光源发射容易稳定波长且减小带宽的激光。解决方案:相干光源1由激光源和非线性光学晶体组成,该激光源振荡其振荡频率在带宽上较窄的激光脉冲,该非线性光学晶体用于获得较高谐波或该激光源输出光的总频率的光,并且,利用感应拉曼效应的波长转换单元,通过波长稳定单元3使从相干光源1射出的光的波长稳定,并且,使波长与从气体激光源2射出的激光大致相等的种子光成为波长为种子的光。种子光被同步地注入到由F2激光器等构成的气体激光源2中,该气体激光源2发出波长为190nm以下的光脉冲。从相干光源1发射的光脉冲的上升定时和气体激光源2的振荡脉冲的上升定时由定时控制装置4控制。

著录项

  • 公开/公告号JP3956447B2

    专利类型

  • 公开/公告日2007-08-08

    原文格式PDF

  • 申请/专利权人 ウシオ電機株式会社;

    申请/专利号JP19970283440

  • 发明设计人 堀口 昌宏;

    申请日1997-10-16

  • 分类号G02F1/35;H01S3/108;

  • 国家 JP

  • 入库时间 2022-08-21 21:08:37

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