Calculate the difference of the aforementioned

摘要

PROBLEM TO BE SOLVED: To provide a method for relatively easily analyzing and evaluating the internal structure of a thin film made of a material, which includes a plurality of different chemical structures as partial structures and in which each partial structure hardly has any differences in viscoelastic characteristics, electric characteristics, or optical characteristics, without causing difficulties in segmenting substrates through the use of a surface shape observing apparatus such as AFM (atomic force microscope) capable of observing the surface of the thin film at high resolution of nanometer scale.;SOLUTION: The method for analyzing the internal structure of the thin film comprises a process for gradually etching the thin film in its in-plane direction through the use of at least two or more steps without causing differences in etching conditions, a process for measuring the surface shape of the thin film before and after each etching step, a process for storing the measured surface shape of the thin film as coordinate numerical value data, a process for determining the numerical value of etching rate at each part of the interior of the thin film by computing the differences of the coordinate numerical value data each between the etching steps, and a process for displaying the etching speed at each part of the thin film.;COPYRIGHT: (C)2004,JPO