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Method and system for detailed placement of layout objects in a standard-cell layout design
Method and system for detailed placement of layout objects in a standard-cell layout design
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机译:在标准单元布局设计中详细放置布局对象的方法和系统
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摘要
A method and system for detailed placement of layout objects in a standard-cell layout design are disclosed. Layout objects comprise cells and etch dummies. The method includes a programming based technique to calculate layout object perturbation distances for the layout objects. The method includes adjusting the layout objects with their corresponding layout object perturbation distances. This leads to improved photolithographic characteristics such as reduced Critical Dimension (CD) errors and forbidden pitches in the standard-cell layout.
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