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Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
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机译:深紫外线单倍放大投射光学系统和投射曝光装置
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摘要
A 1× projection optical system for deep ultra-violet (DUV) photolithography is disclosed. The optical system is a modified Dyson system capable of imaging a relatively large field at high numerical apertures at DUV wavelengths. The optical system includes a lens group having first and second prisms and four lenses having a positive-negative-positive negative arrangement as arranged in order from the prisms toward the mirror. A projection photolithography system that employs the projection optical system of the invention is also disclosed.
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