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Multivariate control of semiconductor processes

机译:半导体工艺的多变量控制

摘要

A method for detecting a fault condition of a manufacturing process involving acquiring data and developing a model based on a plurality of manufacturing related variables for a plurality of outputs of a manufacturing process. The method also involves identifying which of the manufacturing related variables have a substantial affect on the model for detecting faulty outputs of the manufacturing process. The method also involves updating the model by using the manufacturing related variables identified as having a substantial affect on the model to improve the ability of the model to detect faulty outputs of the manufacturing process.
机译:一种用于检测制造过程的故障状况的方法,该方法包括获取数据并基于用于制造过程的多个输出的多个制造相关变量来开发模型。该方法还涉及识别哪些制造相关变量对用于检测制造过程的错误输出的模型有实质性影响。该方法还涉及通过使用被识别为对模型有重大影响的制造相关变量来更新模型,以提高模型检测制造过程的错误输出的能力。

著录项

  • 公开/公告号US7151976B2

    专利类型

  • 公开/公告日2006-12-19

    原文格式PDF

  • 申请/专利权人 KUO-CHIN LIN;

    申请/专利号US20050229153

  • 发明设计人 KUO-CHIN LIN;

    申请日2005-09-16

  • 分类号G06F19;

  • 国家 US

  • 入库时间 2022-08-21 21:00:38

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