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Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes
Method and system for designing manufacturable patterns that account for the pattern- and position-dependent nature of patterning processes
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机译:用于设计可制造图案的方法和系统,该方法和系统考虑了图案形成过程中与图案和位置有关的性质
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摘要
Computational models of a patterning process are described. Any one of these computational models can be implemented as computer-readable program code embodied in computer-readable media. The embodiments described herein explain techniques that can be used to adjust parameters of these models according to measurements, as well as how predictions made from these models can be used to correct lithography data. Corrected lithography data can be used to manufacture a device, such as an integrated circuit.
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