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Treatment condition decision method, treatment condition decision system, treatment system, treatment condition decision calculator program, program recording medium, and semiconductor device manufacturing method

机译:治疗条件决定方法,治疗条件决定系统,治疗系统,治疗条件决定计算器程序,程序记录介质以及半导体装置的制造方法

摘要

In step S11, quantities that are varied (parameters) are respectively varied in a stepwise manner at a specified pitch, and standard working conditions consisting of combinations of these parameters are determined. For all of the standard working conditions, a working is actually performed, and the treated shapes that are obtained as a result are taken as the standard treated shapes for the respective standard working conditions (step S12). In cases where an appropriate simulation program is available, the standard treated shapes may be determined by simulation without actually performing a working. The standard working conditions and standard treated shapes thus determined are stored in a memory device. When the desired shape that is to be obtained by working is given in step S13, a standard treated shape that is close to the desired shape is sought in step S14. Thus, when a treated shape is given, the working conditions for this treated shape can be determined.
机译:在步骤S 11 中,以指定的间距分别逐步地改变变化的量(参数),并且确定由这些参数的组合组成的标准工作条件。对于所有的标准作业条件,实际上进行加工,将得到的处理形状作为各标准作业条件的标准处理形状(步骤S 12 )。如果有合适的模拟程序可用,则可以通过模拟确定标准处理的形状,而无需实际执行工作。这样确定的标准工作条件和标准处理的形状被存储在存储设备中。当在步骤S 13 中给出要通过加工获得的期望形状时,在步骤S 14 中寻求接近期望形状的标准处理形状。因此,当给出处理后的形状时,可以确定该处理后的形状的工作条件。

著录项

  • 公开/公告号US7203564B2

    专利类型

  • 公开/公告日2007-04-10

    原文格式PDF

  • 申请/专利权人 TATSUYA SENGA;YOSHIJIRO USHIO;

    申请/专利号US20040924201

  • 发明设计人 TATSUYA SENGA;YOSHIJIRO USHIO;

    申请日2004-08-24

  • 分类号G06F19;

  • 国家 US

  • 入库时间 2022-08-21 21:00:09

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