首页>
外国专利>
METHOD AND APPARATUS FOR IN SITU DEPOSITING OF NEUTRAL CS UNDER ULTRA-HIGH VACUUM TO ANALYTICAL ENDS
METHOD AND APPARATUS FOR IN SITU DEPOSITING OF NEUTRAL CS UNDER ULTRA-HIGH VACUUM TO ANALYTICAL ENDS
展开▼
机译:在超高真空下将中性CS原位沉积到分析端的方法和装置
展开▼
页面导航
摘要
著录项
相似文献
摘要
The present invention relates to a method for modifying the electronic properties of a surface to analytical ends, such as SIMS or electron spectroscopy, characterised in that it comprises in situ deposition of pure neutral cesium (CsSUP0/SUP), under ultra-high vacuum, said neutral cesium being enabled in the form of a collimated adjustable stream. The invention relates also to the special column designed for implementing the method and to the corresponding energy and/or mass analyser instrument.
展开▼