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METHOD UND APPARATUS FOR RAPID PRINTING OF NEAR-FIELD AND IMPRINT LITHOGRAPHIC FEATURES
METHOD UND APPARATUS FOR RAPID PRINTING OF NEAR-FIELD AND IMPRINT LITHOGRAPHIC FEATURES
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机译:快速打印近场和隐式光刻特征的方法和设备
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摘要
An apparatus, systems, and methods to print multiple fields on a substrate in parallel are provided. The apparatus incorporates a lithographic apparatus composed of two or more lithographic heads coupled to a common housing as a unit, with each head configured to hold a patterned template. Software can be utilized to keep track of what is printed at any given step, and conventional servometers can be used to reposition the head unit and templates in multiple steps to print the remainder of a wafer.
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