LENSED FIBER ARRAY FOR SUB-MICRON OPTICAL LITHOGRAPHY PATTERNING

摘要

In accordance with various embodiments, there is an exposure system (100) for writing a pattern on a photosensitive material (140) . The exposure system can include a waveguide array(llθ) and a light modulator (130). The waveguide array can include a plurality of optical fibers (111, 116) that focuses light on the radiation sensitive material . The light modulator can modulate the light coupled into the plurality of optical fibers . Exemplary exposure systems can reduce aberrations due to coma and distortion, and provide improved alignment.