MANUFACTURING METHOD OF ORGANIC THIN-FILM USING ION BEAM SPUTTERING

摘要

A method for manufacturing an organic thin film using an ion beam sputtering is provided to prevent a substrate from being damaged by a radio frequency sputtering scheme by forming an organic thin film having an improved adhesive force. A method for manufacturing an organic thin film using an ion beam sputtering includes the step of: forming an organic thin film by sputtering an organic material target(30) within a vacuum chamber by an ion acceleration of an ion gun(10). The organic target(30) is made by sintering a powder type organic material. The ion within the vacuum chamber is an inert gas ion. The inert gas ion is an argon gas.