CENTER PIN OF A WAFER STAGE OF AN EXPOSURE APPARATUS

摘要

A wafer stage center pin for an exposure apparatus is provided to eliminate a limitation for an amount of rotation compensation of a wafer by rotating the wafer at a wanted angle, thereby shortening a time required for an exposure process. A body(110) is movably installed on a wafer stage(200) to support a center of a wafer at an upper end thereof. A lifting member(120) is provided on one side of the body to lift the body. A motor(130) has a rotation shaft connected to a lower portion of the body to rotate the body corresponding to a rotation angle of the rotation angle, thereby compensating a rotating amount of the wafer. The body has a vacuum hole for chucking the wafer at an upper end thereof.