METHOD FOR PREPARING A HIGH RESOLUTION PATTERN WITH A HIGH ASPECT RATIO AND THE PATTERN THICKNESS REQUIRED BY USING DEEP ABLATION

摘要

A method for preparing a high resolution pattern with a high aspect ratio and a pattern thickness required by using deep ablation is provided to obtain a high pattern aspect ratio by using a thickness of a sacrificial film. A sacrificial film(30) having a thickness of 100Îbeta/alpha or more is attached on a substrate(10) where alpha is a volume ratio of a final layer of functional materials and beta is a required pattern thickness. A pattern mold is formed by irradiating energy beams on the attached sacrificial film in order to pattern the sacrificial film resist in a desired pattern. A lamination process is performed to laminate the functional materials on the pattern mold.