Method for fabricating liquid crystal display device having high aperture ratio and high transmitance

摘要

This invention discloses a method for producing a high aperture ratio and high transmittance of the liquid crystal display device. Method of the disclosed invention, the step of depositing a transparent metal film and in turn opaque metal film on a transparent insulating substrate; The non-transparent second photosensitive film pattern having a relatively thin thickness than the first photoresist pattern while covering the gate line and the portion to be the first photosensitive film pattern and the counter electrode is formed to cover the portion to be a common signal line, including the light-shielding film formed on the metal film forming; Removing a portion of the thickness of the first and second photosensitive film is exposed using the pattern as an etch barrier metal film of opaque primarily by dry etching to form a gate line and the addition of the first and second photosensitive film pattern; Step of wet etching to form a counter electrode of a rectangular plate form an exposed part using a transparent metal film having a thickness of the removed part of the first and second photosensitive film pattern as an etching barrier; The counter electrode and the second dry etching process to the substrate formed of the first output portion of the thickness of the photoresist pattern and the second pattern such that the photoresist is completely removed and also addition, the second photosensitive film pattern is removed and the non-transparent metal film portion is exposed forming a common signal line, including the light-shielding film by etching; Characterized by comprising; and removing the remaining first photoresist pattern.