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systems and methods for detecting focus variation in photolithograph process using test features printed from photomask test pattern images
systems and methods for detecting focus variation in photolithograph process using test features printed from photomask test pattern images
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机译:使用从光掩模测试图案图像打印的测试特征来检测光刻过程中焦点变化的系统和方法
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摘要
Systems and methods are provided for detecting focus variation in a lithographic process using photomasks having test patterns adapted to print test features with critical dimensions that can be measured and analyzed to determine magnitude and direction of defocus from a best focus position of an exposure tool during the lithographic process.
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