A HARDENED THIN FILM WITH SUPERIOR SURFACE INTENSITY AND BRIGHT AND A PROCESS OF THEREOF

摘要

A thin film which exhibits excellent performance in a processing that requires lubricity of the thin film by colliding gas ions or/and metal ions with a deposited thin film in a coating furnace, thereby removing coarse particles and allowing the surface of the thin film to maintain lubricity, and a manufacturing method of the thin film are provided. A hard thin film with superior surface roughness and brightness is characterized in that an upper layer surface of the hard thin film has a surface roughness(Ra) of 0.01 to 0.08 mum by performing ion etching of a nitride-based hard thin film deposited on a cutting tool or a wear resistant tool by a physical vapor deposition method within a coating furnace. The nitride-based hard thin film is a TiN, TiCN, or TiAlN thin film. The ion etching is performed using gas or/and metal ions. The gas is Ar, Kr, or a mixed gas thereof, and the metal ions are ions of Ti, Cr, Si, Zr, Y, V, Al, or combinations thereof.