首页> 外国专利> Method for producing a microstructured surface relief by embossing thixotropic layers

Method for producing a microstructured surface relief by embossing thixotropic layers

机译:通过压印触变层产生微结构化表面浮雕的方法

摘要

A method is described for producing a microstructured surface relief by applying to a substrate a coating composition which is thixotropic or which acquires thixotropic properties by pretreatment on the substrate, embossing the surface relief into the applied thixotropic coating composition with an embossing device, and curing the coating composition following removal of the embossing device. The substrates obtainable by this method, provided with a microstructured surface relief, are particularly suitable for optical, electronic, micromechanical and/or dirt repellency applications.
机译:描述了一种通过以下方式生产微结构表面浮雕的方法:将触变的或通过预处理在基材上获得触变性的涂料组合物涂覆到基材上,用压花装置将表面浮雕压印到所施加的触变涂料组合物中,并固化该涂料。去除压花装置后的涂料组合物。通过这种方法可获得的具有微结构化表面浮雕的基材特别适合于光学,电子,微机械和/或防污应用。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号