Method for the optimization of the imaging properties of at least two optical elements, as well as photolithographic manufacturing processes

摘要

Method for the optimization of the imaging properties of at least two optical elements, in which the relative position of the optical elements for the optimization of the optical imaging is adjusted with respect to one another, with the following process steps:a) determining a polarization-dependent disturbance variable for at least one optical element (9, 10);b) calculating a target position of at least one movable optical element (9) of the disturbance variables which for this, and for the at least one additional optical element were determined,c) moving the movable optical element (9) into the target position;characterized in thatthe calculation of the target position is effected in such a way that in the target position to the total size of all the optical elements (9, 10), composed of polarization-dependent and polarisation-independent disturbance variables, is minimized.