首页> 外国专利> Lens e.g. illumination lens, for use in microlithography system, has optical lenses aligned to each other according to local distribution or variation of their optical characteristics, where lenses are arranged along optical axis

Lens e.g. illumination lens, for use in microlithography system, has optical lenses aligned to each other according to local distribution or variation of their optical characteristics, where lenses are arranged along optical axis

机译:镜头例如用于微光刻系统的照明透镜具有根据其光学特性的局部分布或变化而彼此对准的光学透镜,其中透镜沿光轴排列

摘要

The lens has a set of optical lenses that are aligned to each other according to local distribution or variation of their optical characteristics, where mutual alignment of the lenses takes place by determining an azimuthal orientation and/or rotation of the lenses around an optical axis, along which the lenses are arranged. A range of maximum deviation of the optical characteristic such as a range of transmission modulation is specified for each optical lens, where the range of maximum deviation is aligned with respect to the optical axis. An independent claim is also included for a method for manufacturing a lens.
机译:透镜具有一组光学透镜,该光学透镜根据其光学特性的局部分布或变化彼此对准,其中,通过确定透镜的方位角方向和/或绕光轴的旋转来进行透镜的相互对准,沿其排列透镜。对每个光学透镜指定光学特性的最大偏差范围,例如透射调制范围,其中最大偏差范围相对于光轴对准。还包括一种用于制造镜片的方法的独立权利要求。

著录项

  • 公开/公告号DE102005033376A1

    专利类型

  • 公开/公告日2007-01-18

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT AG;

    申请/专利号DE20051033376

  • 发明设计人 WALTER MARKUS;BROTSACK MARKUS;EVA ERIC;

    申请日2005-07-16

  • 分类号G02B13/00;G03F7/20;

  • 国家 DE

  • 入库时间 2022-08-21 20:29:54

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