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Simulation method for an optical formation device involves the calculation from a pre-defined value from a value range of an image defect of the image device's influenced parameters
Simulation method for an optical formation device involves the calculation from a pre-defined value from a value range of an image defect of the image device's influenced parameters
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机译:用于光学形成装置的模拟方法包括根据图像装置的受影响参数的图像缺陷的值范围的预定值进行计算。
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摘要
The simulation method involves the calculation from a pre-defined value from a value range of an image defect of the image device's influenced parameters. The predefined image knowledge base of the image device is optimised such that the value range is predefined. The parameter of the optical image devices is adjustable via the value range. The calculated evaluation may be implemented iteratively.
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