Methods of modeling and parameter determination for an illumination distribution in photolithographic imaging of a mask on a semiconductor wafer supplies calculated illumination distributions

摘要

A method of modeling an illumination distribution in a lighting pupil region of an imaging unit for a photolithographic image of a structure in a mask on a semiconductor wafer in which a known model is used comprises supplying calculated light distributions through at least one user-defined filter with the illumination distribution intensity lying between zero and 100%. Independent claims are also included for three methods for parameter determination for the method above.