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Process for installing and/or deinstalling a hollow/filled magnetic target on a cathode magnetron for cathodic pulverization, comprises generating a permanent magnetic field above the target for controlling a magnetron magnetic field
Process for installing and/or deinstalling a hollow/filled magnetic target on a cathode magnetron for cathodic pulverization, comprises generating a permanent magnetic field above the target for controlling a magnetron magnetic field
The process for installing and/or deinstalling a hollow/filled magnetic target (14) on a cathode magnetron (10) for cathodic pulverization, comprises generating a permanent magnetic field above the target for controlling a magnetron magnetic field. The permanent magnetic field is adapted with the cathode.
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