首页> 外国专利> METHOD FOR MANUFACTURING COMPOSITION FOR FORMING ORGANIC ANTIREFLECTION LAYER AND METHOD FOR MANUFACTURING PRODUCT HAVING ORGANIC ANTIREFLECTION LAYER

METHOD FOR MANUFACTURING COMPOSITION FOR FORMING ORGANIC ANTIREFLECTION LAYER AND METHOD FOR MANUFACTURING PRODUCT HAVING ORGANIC ANTIREFLECTION LAYER

机译:用于形成有机抗反射层的组合物的制造方法和具有有机抗反射层的产品的制造方法

摘要

PPROBLEM TO BE SOLVED: To provide a method for manufacturing a composition for forming an organic antireflection layer, from which an organic antireflection layer can be formed on a substrate or at least one layer of a basecoat layer formed on the substrate surface while suppressing formation of cracks in the substrate or in the basecoat layer. PSOLUTION: The method for manufacturing a composition for forming an organic antireflection layer includes: a step of preparing a mixture for forming an antireflection layer; adjusting the prepared mixture for forming an antireflection layer by diluting and stirring; and ageing the adjusted mixture for forming an antireflection layer after stirring is terminated. The ageing step includes a step of keeping the mixture for forming an antireflection layer after the adjusting step, at a temperature of 20C to 40C for 24 to 168 hours. PCOPYRIGHT: (C)2008,JPO&INPIT
机译:

要解决的问题:提供一种用于制造用于形成有机抗反射层的组合物的方法,由此可以在基底上或在基底表面上形成的底涂层的至少一层上形成有机抗反射层。抑制在基材或底涂层中形成裂纹。

解决方案:用于形成有机抗反射层的组合物的制造方法包括:制备用于形成抗反射层的混合物的步骤;通过稀释和搅拌调节制备的用于形成抗反射层的混合物。并在搅拌后终止用于形成抗反射层的调节混合物的老化。老化步骤包括在调节步骤之后将用于形成抗反射层的混合物在20℃至40℃的温度下保持24至168小时的步骤。

版权:(C)2008,日本特许厅&INPIT

著录项

  • 公开/公告号JP2008139531A

    专利类型

  • 公开/公告日2008-06-19

    原文格式PDF

  • 申请/专利权人 SEIKO EPSON CORP;

    申请/专利号JP20060325278

  • 发明设计人 TAKADA KEISUKE;KUTSUKAKE YUSUKE;

    申请日2006-12-01

  • 分类号G02B1/11;G02B1/04;B32B7/02;C08J7/04;

  • 国家 JP

  • 入库时间 2022-08-21 20:25:37

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