PROBLEM TO BE SOLVED: To provide an excimer vacuum ultra-violet light irradiation treatment apparatus for effectively irradiating a wafer with excimer vacuum ultra-violet light emitted from an excimer vacuum ultra-violet light lamp and for successfully changing quality of a thin film of wafer by utilizing the vacuum ultra-violet light.;SOLUTION: The excimer vacuum ultra-violet light irradiation treatment apparatus 10 includes a chamber 12 for storing a wafer 16, a vacuum pump 13 for maintaining the inside of the chamber 12 to the vacuum condition, a gas supplier 14 for supplying nitrogen into the chamber 12, a heater 15 for heating the wafer 16 stored in the chamber 12 to the predetermined temperature, and an excimer vacuum ultra-violet light lamp 21 for irradiating the thin film of wafer 16 stored in the chamber 12 with the excimer vacuum ultra-violet light. The apparatus 10 directly applies the vacuum ultra-violet light to the thin film of wafer 16 stored within the chamber 12 that is maintained in the vacuum condition, while the lamp 21 is exposed within the chamber 12.;COPYRIGHT: (C)2008,JPO&INPIT
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