METHOD AND SYSTEM FOR CONTROLLING UNIFORMITY IN BALLISTIC ELECTRON BEAM ACCELERATING PLASMA PROCESSING SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a method and a system that adjust and control uniformity, in plasma in a plasma processing system.;SOLUTION: The plasma processing system includes an electron source electrode, where direct current (DC) power is coupled to generate a ballistic electron beam in etching a substrate. A ring-like electrode, provided at a periphery of the substrate as opposed to the electron source electrode, is used to generate a ring-like hollow cathode plasma that affects the variations of density distribution of the plasma.;COPYRIGHT: (C)2008,JPO&INPIT