CLEANING MEMBER, TRANSFER MEMBER WITH CLEANING FUNCTION, AND CLEANING METHOD FOR SUBSTRATE PROCESSOR

摘要

PROBLEM TO BE SOLVED: To provide a cleaning member capable of easily, certainly, and sufficiently removing fine foreign matter, preferably, foreign matter of a submicron scale; to provide a transfer member with a cleaning function that has the cleaning member; and to provide a cleaning method for a substrate processor using the transfer member with the cleaning function.;SOLUTION: The cleaning member includes a cleaning layer having a plurality of projections of pillarlike structures on its surface. The aspect ratio of the projections of the pillarlike structures is 5 or more.;COPYRIGHT: (C)2008,JPO&INPIT