PHOTOSENSITIVE RESIN COMPOSITION, BLACK MATRIX AND METHOD FOR MANUFACTURING THEREFOR, TRANSISTOR ARRAY SUBSTRATE AND METHOD FOR MANUFACTURING THEREFOR, AND COLOR FILTER SUBSTRATE AND METHOD FOR MANUFACTURING THEREFOR

摘要

PROBLEM TO BE SOLVED: To obtain high OD (optical density), while maintaining patterning accuracy.;SOLUTION: The present invention provides a photosensitive resin composition containing a material, having chromic characteristics in a positive or negative photoresist. The OD of the photosensitive resin composition can be varied, by heating, irradiation with light or the like. Thus, by increasing the OD by heating or irradiating with light after patterning, a black matrix with higher OD, while maintaining high patterning accuracy, can be obtained.;COPYRIGHT: (C)2009,JPO&INPIT