SURFACE TREATMENT MATERIAL, SUBSTRATE, AND METHOD OF TREATING SURFACE OF SUBSTRATE, THIN FILM TRANSISTOR, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a patterning method of high production efficiency in high precision of an organic semiconductor layer or a thin film such as a conductive film, and to provide an organic TFT of high performance of high mobility and a method of manufacturing the organic TFT of high production efficiency in high precision.;SOLUTION: A surface treatment material has a protection group decomposed under existence of acid in a molecule. A method of highly precisely obtaining a pattern of a conductive thin film such as an electrode film with excellent reproducibility by performing formation of the organic semiconductor layer having high carrier mobility with excellent production efficiency at the same time is provided.;COPYRIGHT: (C)2008,JPO&INPIT