首页> 外国专利> SUPPORT STRUCTURE OF ELECTRO-OSMOSIS MATERIAL, ELECTRO-OSMOSIS FLOW PUMP, GENERATING SET, AND ELECTRONIC EQUIPMENT

SUPPORT STRUCTURE OF ELECTRO-OSMOSIS MATERIAL, ELECTRO-OSMOSIS FLOW PUMP, GENERATING SET, AND ELECTRONIC EQUIPMENT

机译:电渗物质,电渗流泵,发电机组和电子设备的支撑结构

摘要

PPROBLEM TO BE SOLVED: To inhibit damage of electro-osmosis material even when impact is caused. PSOLUTION: A circular opening 61 is formed in the center part of a support frame 6, and electro-osmosis materials 3 are arranged and supported in the opening 61. Damping chambers (spaces) 62 are formed on the support frame 6 in the circumference of the opening 61. Elastic strips 63 separating the damping chambers 62 and the opening 61 are formed because the damping chambers 62 are penetrated, and projections 64 arranged in the center part in the circumferential direction of the elastic strips 63 protrude toward the center of the opening 61. The electro-osmosis materials 3 are fit inside the opening 61, the edges of the electro-osmosis materials 3 abut to the projections 64, and the electro-osmosis materials 3 are supported by the projections 64 and the elastic strips 63. Damping materials 65 are filled in the gaps between the edges of the electro-osmosis materials 3 and the wall part of the opening 61. PCOPYRIGHT: (C)2008,JPO&INPIT
机译:

要解决的问题:即使在造成冲击时,也要抑制电渗物质的损坏。

解决方案:在支撑框架6的中央部分形成圆形开口61,并且在该开口61中布置并支撑电渗材料3。在支撑框架6中形成阻尼室(空间)62。因为阻尼室62被穿透,所以形成了将阻尼室62和开口61分开的弹性条63,并且在弹性条63的圆周方向上布置在中央部分的突起64朝着中心突出。电渗材料3安装在开口61的内部,电渗材料3的边缘邻接突起64,并且电渗材料3由突起64和弹性条支撑。 63.阻尼材料65填充在电渗材料3的边缘与开口61的壁部之间的间隙中。

版权所有:(C)2008,JPO&INPIT

著录项

  • 公开/公告号JP2008069711A

    专利类型

  • 公开/公告日2008-03-27

    原文格式PDF

  • 申请/专利权人 CASIO COMPUT CO LTD;

    申请/专利号JP20060249357

  • 发明设计人 SUNAGO TAKAYUKI;KABASAWA YASUNARI;

    申请日2006-09-14

  • 分类号F04B9;H01M8/04;H01M8/06;H01M8;B81B3;F16F15/04;

  • 国家 JP

  • 入库时间 2022-08-21 20:24:01

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